Category: Process Subcategory: Plasma Etch, Ashing, Desum, RIE & ICP
Manufacturer: Plasmatherm Model: Dual chamber 730/720 RIE Plasmatherm
Equipment Name: Plasmatherm PTI 76534 Configuration: 3-8 inch wafers
Year: 1994 Condition: Excellent
Quantity: 1 Availability: In Stock, Immediately
Pricing: Call for Pricing Movie:
Description:
Plasmatherm Dual Chamber Reactive Ion Etcher/PECVD, Plasma Shuttle-Lock load-lock loading system with platen transfer Model 700 Al Chamber with 11” RIE substrate electrode, MKS 286 Flow Controller,Plasmatherm Windows based OS,(2)MKS Ion gauge controller 290,Advanced Energy RF5S power supply,AM502 matching network,Leybold 361C turbo,gas distribution center w/(5) MKS mass flows installed- Full set of Plasmatherm software 208V, 3 phase, 30A
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