Category: Process Subcategory: ICP
Manufacturer: Plasmatherm Model: Plasmatherm Dual Chamber 770 ICP
Equipment Name: Plasmatherm PTI-81054F Configuration: up to 8" wafers
Year: 1997 Condition: Excellent
Quantity: 1 Availability: In Stock, Immediately
Pricing: Call for Pricing Movie:
Plasmatherm SLR Dual Chamber 770 ICP (Ion Coupled Plasmaer)Etcher, Load Lock Shuttle Lock transfer, RFPP–RF5S RF power supply w/AM5, Six zone heater,PM5 Pressure Controller, RF20M w/phase,Model 919 Hot Cathode Controller,VAT PM5 Adaptive Pressure Controller,dual pumping stack w/Leybold 600C, Leybold D65BCS, dual Sofie Endpoint detectors, Gas chemistry (non-clorine side - 5 MFCs and 1 N2 purge),(clorine side - 4 MFCs with (2) N2 purges),Plasmatherm windows based OS, 208V, 3 Phase, 50/60 Hz
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