Category: Metrology Subcategory: Critical Dimension & Line Width
Manufacturer: Nanometrics Model: CD-50-2
Year: Condition: Excellent - Refurbished
Quantity: 3 Availability: In Stock, Immediately
Pricing: Call for Pricing Movie:
Description:
Critical Dimension Measurement MEASUREMENT SYSTEM TO INCLUDE: 1 NANOMETRICS MICROSCOPE WITH TRINOCULAR HEAD, ISOLATION STAND, WHK 10X/20L EYEPIECES, OBJECTIVES: MS PLAN 5X/0.13, MS PLAN 20X/0.46, ULWD MS PLAN 50X/0.55 X-Y-Z STAGE, computers 7 video camera, Critical Dimension Measurement System. Computer controlled scanning photometric microscope instrument designed for measuring line widths, gaps and registration alignment. The effective measuring range is 0.5 to 125.0 microns. Stage X-Y movement: 4 in. x 4 in. Scan time of less than 5 secs. Mfg. 1999. 115V, 50/60 Hz
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