Category: Process Subcategory: Plasma Etch, Ashing, Desum, RIE & ICP
Manufacturer: Oxford Model: 133 ICP - 380 Source
Equipment Name: 9C99631 Configuration:
Year: Condition: Excellent
Quantity: 1 Availability: In Stock, Immediately
Pricing: Call for Pricing Movie:
Description:
133 Ion Coupled Plasma Etcher, 380 size chamber, M5 VAT valve controller, Advanced Energy RFX600A & HFV 8000 RF power suppliies, Alcatel Turbo 1000M with NT20 controller,Endpoint detector type TB-XY-MA16, 208V 60Hz
Close Product Details