All Items in Database
Process
| Manufacturer | Type | Description |
Picture
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| YES | R1 | The R1 can be used in Active, Electron-free or RIE modes. Advanced Energy PE1000 RF power supply with matching network,Lark sequential microprocessor which allows up to 90 separate one,two or three gas programs to be inputted and stored in memory,Granville Phillips 275,System has three plasma gas inputs, A backfill input is provided as standard. Inside chamber dimensions 16"x16"x16", (8)14" x 14" trays, 115V,60Hz,1.4A, 175W | |
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| YES | YES - 15 | HMDS oven - "Ultra Clean" 8 cassettes of 4 in. wafers, or 1 cassette of 5-8 in. wafers, CLEANLINESS:< 1x1 micron particle and < 10 x 0.5 - micron particles per 6-in. wafer THROUGHPUT: 2 full loads/hr. HMDS USAGE: <5 ml/200 wafers (75 prime cycles/pint) TEMPERATURE: 160°C max Outer system stainless steel 120V, 60Hz, 14.2 amps | |
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| YES | R3 | Model R3 Low Frequency Plasma Cleaner, Sequential microprocessor which allows up to 90 separate one or two gas programs. YES 500 Watt power supply - model number CLF 500/50, two gas inputs with one backfill input. Four 12 3/4 x 12 3/4 electro sets/sample trays, (2) additional trays, Total Capacity = 325 sq. in., pilot run quantities, 115V, 60 Hz, single phase, 1.5 amps, 175 W. | |
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| YES | LP III - 5 | HMDS oven, Micromaster,Athena Controller, 16" x 16"x 16" Stainless steel chamber, flask & 7cfm pump | |
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| YES | YES-58 | HMDS oven & Reversal Image, Micromaster Programer,Athena Controller,Grainville Phillips Convection guage, 16" x 16" x 16" Stainless steel chamber, flask, 110V | |
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| YES | YES-58 | HMDS oven & Reversal Image, Micromaster Programer,Athena Controller,Grainville Phillips Convection guage, 16" x 16" x 16" Stainless steel chamber, flask, 110V | |
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| YES | 6A | Yeild Engineering Systems model 6A HMDS/Image Reversal Oven,West 2073 controller, 16.5" x 16.5" x 16.5" Stainless Chamber w/removalble S.S shelf, Stainless Steel exterior, 120V, 60Hz, 12 Amps, 1700W | |
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