All Items in Database
Process
| Manufacturer | Type | Description |
Picture
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| Plasmatherm | 700 VLR (Versalock ) PECVD | Plasmatherm Versalock PECVD System with (1) LM/TM module (2) PECVD module - 5 MKS Mass Flow Controllers (N2,He, CF4, Silane, spare) RFPP-RF5S RF power supply, Leybold DryVac 50P,Plasmatherm operating software,208V, 60Hz, 3 phase | |
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| Plasmatherm | SLR 720 RIE Plasmatherm | Plasmatherm SLR 720 RIE,700 series Aluminum Chamber with load lock, 11" bottom electrode,six zone heated chamber,Lebyld 360C turbo w/ENI controller, Advance Energy RFPP 5S RF power supply w/AM5 matching network and tunner,Gas configuration (4) MKS Clorine based system)Single post lift,Plasmatherm Windows OS, 208V,3 phase,60 Hz. | |
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| Plasmatherm | 770 ICP Plasmatherm | Plasmatherm SLR 770 ICP (Ion Coupled Plasma)Etcher, Load Lock Shuttle Lock transfer, Single chamber ICP,RFPP–RF5S RF power supply w/AM5, Six zone heater,PM5 Pressure Controller, RF20M w/phase,He backside cooled,Model 919 Hot Cathode Controller,VAT Adaptive Pressure Controller,(8) MFCs-gas(BCL3,Cl2,HBr,N2,N2,N2,H2,N2),Leybold 600C, Leybold D40B CS,Leybold D16B, Plasmatherm PC OS,Sofie Endpoint | |
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| Plasmatherm | 7300 PECVD Plasmatherm | Plasmatherm PC operated 7000 PECVD system,32" upper electrode (5) MFCs - MKS 1479A - N2 purge,NF3- 2000sccm,N2-1000sccm,He-5000sccm,NH3-50sccm,SiH4-2000sccm,RF20S power supply w/matching network, PC operated software,208V-60Hz | |
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| Plasmatherm | Batchtop VII Plasmatherm | Plasmatherm Table top RIE, Plasmatherm Windows operating software, 6" lower electrode RIE, Advanced Energy RFPP-RF5S (500W - 13.56Mhz) RF power supply with AM5 matchbox and tunner, can process up to 6" dia. wafers, (3) Mass Flow controlls (all 100 sccm MKS 1160Bs type), 208V, 60Hz | |
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| Plasmatherm | 790 RIE Plasmatherm | Plasmatherm Standalone RIE (Reactive Ion Etch) System w/endpoint detector. 8" electrode,RIE (lower electrode only) RFPP - RF5S power supply, Leybold 151C turbo, Neslab/RTE 111 Chillers, (6) MKS MFCs, Non-Clorine based system with N2 purge, End point detector, Plasmatherm Windows OS, 208V, 3 phase, 60Hz | |
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| Plasmatherm | SLR 720 RIE Plasmatherm | Plasmatherm Reactive Ion Etcher Plasma Shuttle-Lock load-lock loading system with platen transfer Model 700 Al Chamber with 11” RIE substrate electrode and upper showerhead electrode,Z80 controller (upgrade to PC software is an option)MKS 286 controller,MKS Ion gauge controller 290,RF generator,MKS 252 exhaust valve controller,Stroke Vane Pump – Model 017-24,Leybold 361C turbo,gas distribution center w/(6) MKS mass flows installed- N2,O2,Clorine,Sufur Hexafluoride,Freon 14,Freon 23, Full set of Plasmatherm software, Pumps for process and load lock included, Chiller | |
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| Plasmatherm | 790 PECVD Plasmatherm | Plasmatherm Stand alone 790 PECVD deposition system, Plasmatherm PC OS controlled, 8" electrode, Advanced Energy RFPP - RF5S power supply with AM5 matching network, gas panel (5 MFCs-N2,SiH4,NH3,N2,CF4)Watlow chamber wall heater,Leybold WS251 blower with Leybold D65,Neslab RTEIII chiller 208V | |
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| Plasmatherm | 700 VLR (Versalock) RIE Plasmatherm | Plasmatherm Versalock RIE System with (1) LM/TM module (2) RIE module - 5 MKS Mass Flow Controllers (O2, CL2, Ar,CF4,CHF3) RFPP-RF10S RF power supply, Leybold DryVac 50P Leybold 361C turbo with NT20 controller 208V, 60Hz, 3 phase | |
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| Plasmatherm | SLR 720 RIE Plasmatherm | Plasmatherm SLR 720 RIE,700 series Aluminum Chamber with load lock, 11" bottom electrode,MKS 286 controller,six zone heated chamber,MKS 290 Ion Gauge controller,Lebyld 360 turbo w/150/360 controller, Advance Energy RFPP 5S RF power supply w/AM5 matching network,Gas configuration (4) MKS 1159 MFCs-(50,100,100,200 sccm),Plasmatherm Windows OS, 208V,3 phase,60 Hz. | |
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| Plasmatherm | SLR 720 RIE Plasmatherm | Plasmatherm Series VII Load Lock RIE Z-80 processor - (can convert to PC version if customer perfers) | |
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| Plasmatherm | Dual chamber 730/720 RIE Plasmatherm | Plasmatherm Dual Chamber Reactive Ion Etcher/PECVD, Plasma Shuttle-Lock load-lock loading system with platen transfer Model 700 Al Chamber with 11” RIE substrate electrode, MKS 286 Flow Controller,Plasmatherm Windows based OS,(2)MKS Ion gauge controller 290,Advanced Energy RF5S power supply,AM502 matching network,Leybold 361C turbo,gas distribution center w/(5) MKS mass flows installed- Full set of Plasmatherm software 208V, 3 phase, 30A | |
Process
| Manufacturer | Type | Description |
Picture
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| Plasmatherm | Dual Chamber 770 ICP Plasmatherm | Plasmatherm SLR Dual Chamber 770 ICP (Ion Coupled Plasmaer)Etcher, Load Lock Shuttle Lock transfer, RFPP–RF5S RF power supply w/AM5, Six zone heater,PM5 Pressure Controller, RF20M w/phase,Model 919 Hot Cathode Controller,VAT PM5 Adaptive Pressure Controller,dual pumping stack w/Leybold 600C, Leybold D65BCS, dual Sofie Endpoint detectors, Gas chemistry (non-clorine side - 5 MFCs and 1 N2 purge),(clorine side - 4 MFCs with (2) N2 purges),Plasmatherm windows based OS, 208V, 3 Phase, 50/60 Hz |  |
Process
| Manufacturer | Type | Description |
Picture
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| Plasmatherm | SLR 720 RIE Plasmatherm | Plasmatherm Reactive Ion Etcher Plasma Shuttle-Lock load-lock loading system with platen transfer Model 700 Al Chamber with 11” PC - Window based system. Advanced Energy RFPP 500 watt RF generator with matching network. (2) mechanical pumps, Neslab HX 75 chiller, Leybold 361C turon with Leybold NT 150/360 controler,gas distribution center w/(4)Mass flow controller (BCl3-100,Cl2-50,O2-100,N2-50)installed- Full set of Plasmatherm software & manuals, 208V 3 phase |  |
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| Plasmatherm | SLR ECR - Plasmatherm | Plasmatherm ECR microwave etcher Astex model AX2100 -1000W Micorwave generator,Astex 27V, 185 amp ECR power supply, Astex 20V, 125amp ECR power supply,currently set up for 2-8" wafers,Neslab TU-1 chiller, Leybold D65BCS, D16B, RFPP RF5S power supply with AM-5,MKS 286 controller,MKS 290 Ion gauge controller,VAT PM5 Pressure Controller, (6) MFC - CL2,Ar,O2,N2,O2,CF4, N2 purge 208V, 3phase 60amp |  |
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| Plasmatherm | SLR 730 PECVD Plasmatherm | Plasmatherm Shuttle-Lock load-lock loading system with platen transfer Model 700 Al Chamber for PECVD deposition, 2-8" platten,13inch top electrode,Watlow 250 degrees C heater, RF5S RF power supply with AM5 matching network, (8) MKS model 1179 MFCs -N2O,N2,NH3,N2,He, SF6,Silane 2% in He,Silane 1.9% in He,Neslab HX 75 chiller, Plasmatherm Windows OS, 208V, 3 Phase 60amp |  |
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| Plasmatherm | PT530 PECVD Plasmatherm | Plasmatherm PECVD Deposition System RF Plasma Product Model HFS-801S RF power supply (800W-13.56Mhz) with RF Plasma Products model AMN-501 500w-13.56, RF Plasma Products Mode SEV1DC DC power supply (DC bias),Vacuum general Model 80-6A and 80-2 pressure controller, Leybold model 28725 V3,(5) process gases Silane, Nitrous Oxide, nitrogen, Nitrogen. 208V 3 phase |  |
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| Plasmatherm | 770 ICP | Shuttlelock 770 ICP (Ion Coupled Plasma)Etcher, Load Lock Shuttle Lock transfer, Single chamber ICP,RFPP–RF5S RF power supply w/AM5, Six zone heater,VAT PM5 Pressure Controller, RF10M w/phase,,Model 919 Hot Cathode Controller,(6) MFCs-gas,Leybold |  |
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| Plasmatherm | Plasmatherm SLR 720 RIE | Plasmatherm SLR 720 RIE system,Plasmatherm SLR 720 RIE,700 series Aluminum Chamber with load lock, 11" bottom electrode,MKS 286 controller,six zone heated chamber,MKS 290 Ion Gauge controller,Lebyld 360 turbo w/150/360 controller, Advance Energy RFPP 5S RF power supply w/AM5 matching network,Gas configuration (4) MFCs,Plasmatherm Windows OS, 208V,3 phase,60 Hz. |  |
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| Plasmatherm | Dual Chamber PVD-RIE Plasmatherm | Plasmatherm Dual Chamber Reactive Ion Etch (RIE)and Physcial Vapor Deposition system,Dual 700 style Alumimum chambers with Load lock,11 inch lower electrode on both chambers, Advanced Energy RFPP RF5S RF power supply with AM5 matching network and tuner,ENI 5KW DC power supply for PVD application, dual pumping stacks with Leybold 361 turbo pumps and a Leybold 150-360 controller,Gas pannel consist of (4)Four MFCs per side, can increase to (8) eight per side,Plasmatherm Windows Baed OS,208V, 60A, 60Hz, 3 Phase |  |
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| Plasmatherm | 770 ICP Plasmatherm | Plasmatherm SLR 770 ICP (Ion Coupled Plasma)Etcher, Load Lock Shuttle Lock transfer, Single chamber ICP,RFPP–RF5S RF power supply w/AM5, Six zone heater,VAT PM5 Pressure Controller, RF10M w/phase,Model 919 Hot Cathode Ion Controller,VAT Adaptive Pressure Controller,(6) MFCs-gas,Plasmatherm PC OS, 208V, 60A 3 Phase |  |
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| Plasmatherm | 790 PECVD Plasmatherm | Plasmatherm 790 PECVD, non-load lock,11" upper & lower electrode, Advanced Energy RFSS 5S 500W 13.56Mhz power supply w/AM5 matching network and controller, Lower electrode heated platen with controller, Plasmatherm PC Window based OS, 208V 60Hz, 60A |  |
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| Plasmatherm | Cluster Lock RIE Plasmatherm | Plasmatherm Cassette to Cassette Reactive Ion Etcher, Load Lock chamber w/Leybold 360 turbo,Leybold NT150/260 controller,Process chamber with 11" electrode,Advanced Energy RFPP-RF5S/AM5 matching network, Alcatel 1000M turbo w/Alcatel ACT 1000M controller, MKS 252 exhaust valve controller, gas panel consist of (5) MFCs (N2, O2, H2, SF6 & BCl3) |  |
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| Plasmatherm | 7200 RIE Plasmatherm | Plasmatherm Large Batch Chamber RIE Electropolish the stainless steel 30-32" lower electrode powered only Showerhead height can be controlled,(5) Brooks 5850e MFCs,used for BCl3 process for backside via etching of GaAs wafer, RF20F power supply w/matching network,Leybold 360 turbo w/controler,Edwards EM40 w/250 blower, upgraded to PC controllee Plasmatherm software |  |
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| Plasmatherm | 790 PECVD | Plasmatherm 790 PECVD, non-load lock, 13 inch upper & 14 inch lower electrode, Advanced Energy RFSS 5S 500W 13.56Mhz power supply for lower electrode and Advanced Energy LF5S with with AM5 matching network and controller, Lower electrode heated platen with Watlow controller, up to 8 MFCs,Plasmatherm PC Window based OS, 208V 60Hz,60A |  |
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| Plasmatherm | 770 ICP Plasmatherm | Plasmatherm SLR 770 ICP (Ion Coupled Plasma)Etcher, Load Lock Shuttle Lock transfer, Single chamber ICP,RFPP–RF5S RF power supply w/AM5, Six zone heater,VAT PM5 Pressure Controller, RF10M w/phase,Model 919 Hot Cathode Ion Controller,VAT Adaptive Pressure Controller,(6) MFCs-gas,Leybold 600C, Leybold D40BCS,Leybold D16B, Plasmatherm PC OS, 208V, 60A 3 Phase | |
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| Plasmatherm | Dual Chamber SLR 720/720 RIE Plasmatherm | Plasmatherm Dual Chamber Reactive Ion Etch (RIE), Dual 700 style Alumimum chambers with Load lock, 11 inch lower electrode on both chambers, Advanced Energy RFPP RF5S RF power supply with AM5 matching network and tuner,dual pumping stacks with Leybold 361 turbo pumps and a Leybold 150-360 controller,Gas pannel consist of (1) side of (4) MFCs (He, N2,N2& N2) and (1) side of (4) MFCs (He,N2,CFH3 & C2F6), Leybold D40BCs Mechanical pump,Leybold D25 BCS mechanicsl pump,Neslab HX75,Plasmatherm Windows Baed OS,208V, 60A, 60Hz, 3 Phase |  |
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| Plasmatherm | 770 RIE Plasmatherm | Plasmatherm 700 series Reactive Ion etcher (RIE) System perfect for Research & Spectrometry studies,Parallel plate type RIE - 11" Upper electrode & 9" lower electrode,Multi-wafer size design up to 8" wafers, graphite feature plate, adjustable upper electrode height,Seiko seiki turbo pump (STP-H300C), w/ Seiko Seiki STP controller, 9 MFC (all MKS 1159), Advanced Energy RFPP 5S w/ AM5 matching network,290 Ion Gauge controller, MKS 286 Controller,Disconnect box, Plasmathem PC OS,208V, 60amp, 60Hz 3 phase. |  |
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| Plasmatherm | 790 RIE Plasmatherm | Plasmatherm 790 RIE, 700 series Aluminum Chamber without load lock, 11" bottom electrode,Gas panel with (3) MFCs-(2)N2,(1)Cl2,Adnanced Energy RFPP-RF5S RF power supply with AM5 matching networks and tuner,Lebyld 361C turbo w/150/360 controller,Leybold D40 Mechanical pump,Plasmatherm Windows based OS,208V,3 phase,60 Hz. |  |
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| Plasmatherm | 790 RIE Plasmatherm | Plasmatherm Stand alone 790 RIE - Reactive Ion Etch system, Plasmatherm Window based PC controlled with flat panel display, 11" lower electrode, Advanced Energy RFPP - RF10S power (1000W) supply with matching network,MKS 919 Ion gauge controller,gas panel (5 MFCs-O2-50sccm,Cl2-100sccm,Ar-200sccm,CF4-200sccm,CHF3-200sccm),Leybold 361C turbo 208V, |  |
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| Plasmatherm | 790 PECVD/RIE Plasmatherm | Plasmatherm Dual Chamber 790 PECVD & RIE system, Non-Loadlock system RFPP - RF5S RF power supply with matching network, Leybold turbo pump,Plasmatherm Windows based operating system,Gas distribution panel consisting of 6 MFCs per process side. |  |
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| Plasmatherm | SLR 730 PECVD Plasmatherm | Plasmatherm Shuttle lock PECVD deposition system, MKS 286 Mass Flow Controller, (7) MFCs (N2,N2,He,N2,NH3,SF6,N2,Advanced Energy RFPP 5S RF power supply with matching network & tuner,MKS 290 Ion gauge controller,MKS 252 Exhaust controler,Watlow substrate heater,Plasmatherm Windows OS with monitor, keyboard & mouse. |  |
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| Plasmatherm - Unaxis | VLR ICP Plasmatherm (3) PMs | Plasmatherm VLR ICP Cassette to Cassette LM/TM with dual end-effectors,(3)VLR ICP module,Configured for 6" dia. wafer with Clamp, PM1 & PM2 configuration:(8) MFCs,VAT PM5 Throttle valve controller, Edwards STP-A-1303CV2 turbo pump with STPA803C/A1303C controller,ENI 600W RF Power supply for lower electrode with AM5 matchwork and tunner, Advanced Energy RFPP 20M RF power supply for upper electrode with AM20 matchwork and tunner,Heated chamber walls with 6 zone controller, Heated vacuum plumbing lines with separate BriskOne controllers. PM3 configuration:configuration:(8) MFCs,VAT PM5 Throttle valve controller, Leybold Mag 1500CT turbo pump with MagDrive 2000 controller,Advanced Energy RF5S 500W Power supply for lower electrode with AM5 matchwork and tunner, Advanced Energy RFPP 20M RF power supply for upper electrode with AM20 matchwork and tunner,Heated chamber walls with 6 zone controller, LM-TM: Single Load lock, Plamatherm Versaworks software, 208V, 30A 60Hz |  |
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| Plasmatherm - Unaxis | VLR ICP Plasmatherm (1) PM | Plasmatherm VLR ICP Cassette to Cassette LM/TM with dual end-effectors,(1)VLR ICP module, ESC chuck set up for 6" dia. wafers, (8) MFCs (7) which are Unit 1660 type (N2,He,SF6,O2,N2,N2, BCl3),VAT PM5 Throttle valve controller, Edwards STP-A-1303CV2 turbo pump with controller,ENI RF Power supply for lower electrode with AM5 matchwork and tunner, Advanced Energy RFPP 20M RF power supply for upper electrode with AM20 matchwork and tunner,Plamatherm Versaworks software, 208V, 30A 60Hz |  |
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| Plasmatherm-Unaxis | 770 ICP Plasmatherm | Plasmatherm ICP(Ion Coupled Plasma) Etcher Load Lock Shuttle Lock transfer, Model 770,Single chamber ICP, Watlow heater, RFPP – RF5S & 20M power supply, 8.31”electrode, 6" Electrostatic Chuck,(6) MKS MFCs-(O2, N2, Cl2, BCl3,Ar,spare), VAT PM-5,He backside cooling, Neslab 75W,Turbo Pump, Leybold D16B & Leybold D40BCS, Plasmatherm Windows OS |  |
Processs
| Manufacturer | Type | Description |
Picture
|
| Plasmatherm | SLR 720 RIE | Plasmatherm SLR 720 RIE,700 series Aluminum Chamber with load lock, 11" bottom electrode, Lebyld 361C turbo w/150/360 controller, Advance Energy RFPP 5S RF power supply w/AM5 matching network,Gas configuration (4)MFCs-(SF6,CF4, N2,O2 with (2) N2 purges, Leybold D16 roughing pump, Leybold D65 backing pump, Neslab HX75 chiller, 208V,3phase,60 Hz. |  |
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| Plasmatherm-Unaxis | Plasmatherm-Unaxis 790 PECVD | Plasmatherm 790 PECVD, non-load lock,11" upper & lower electrode, Seren 500W 13.56Mhz RF power supply matching network, ENI 600W 13.56Mhz RF power supply, Lower electrode heated platen with Watlow controller,(8) MFCs, VAT gate valve,Plasmatherm PC Window based OS, 208V 60Hz, 60A |  |
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Source Surplus, LLC • 5101 Deerchase Trail • Wake Forest, NC 27587
Email eric@dssurplus.com
• Phone: (919) 556-8930 • Fax: (919) 562-2165