All Items in Database
Metrology
| Manufacturer | Type | Description |
Picture
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| Nanometrics | 8000x | Cassette to Cassette Thin Film measurement system 8" wafer stage, Operating system - IBM OS 75W light source, In line objectives (E10/.25,40/.55,4/.1,15/.28) ellipsometer is an option,115V, 5 amp, 30/60Hz | |
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| Nanometrics | 8000 XSE | Cassette to Cassette Thin Film measurement system w/Ellipsometer 8" wafer stage, Operating system - IBM OS,J.A. Woolham M44 Ellipsometer, LPS-300 75W light source, EC 270, 5-8" pre-aligner 115V, 5 amp, 30/60Hz | |
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| Nanometrics | 4150 | Film Thickness, reflectivity & mapping system,Standard wafer sizes of 6 & 8 inch stages, Single and multiple layer measurement programs,Ability to select film constants,Scan ranges and substrate types,High Speed auto-focus Torret style objectives head,MSPlan 5, MSPlan 10, MSPlan 50,Reflecting objective x15, Programmable mapping stage: Accuracy +/- 2 mm Data Analysis, motorized stage,Stage accuracy: 2mm High resolution contour and 3D mapping,Pulnix TMC-7 camera Rapid Measurement Program development Extensive Data management and SPC capabilities,,Mapping: contour,2D & 3D 115VAC, 5A,50/60Hz | |
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| Nanometrics | 210 | Thin film thickness measurement system for transparent films on 75mm to 150mm wafers, measures 14 standard film types including photoresists, polyimides, polysilicon, oxides, and nitrides in ranges from 100A to 500kA. Typical measurement time 2.5 seconds. | |
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| Nanometrics | 210 | Thin film thickness measurement system for transparent films on 75mm to 150mm wafers, measures 14 standard film types including photoresists, polyimides, polysilicon, oxides, and nitrides in ranges from 100A to 500kA. Typical measurement time 2.5 seconds. | |
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| Nanometrics | CD-50-2 | Critical Dimension Measurement MEASUREMENT SYSTEM TO INCLUDE: 1 NANOMETRICS MICROSCOPE WITH TRINOCULAR HEAD, ISOLATION STAND, WHK 10X/20L EYEPIECES, OBJECTIVES: MS PLAN 5X/0.13, MS PLAN 20X/0.46, ULWD MS PLAN 50X/0.55 X-Y-Z STAGE, computers 7 video camera, Critical Dimension Measurement System. Computer controlled scanning photometric microscope instrument designed for measuring line widths, gaps and registration alignment. The effective measuring range is 0.5 to 125.0 microns. Stage X-Y movement: 4 in. x 4 in. Scan time of less than 5 secs. Mfg. 1999. 115V, 50/60 Hz | |
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| Nanometrics | CD-50-2 | Critical Dimension Measurement MEASUREMENT SYSTEM TO INCLUDE: 1 NANOMETRICS MICROSCOPE WITH TRINOCULAR HEAD, ISOLATION STAND, WHK 10X/20L EYEPIECES, OBJECTIVES: MS PLAN 5X/0.13, MS PLAN 20X/0.46, ULWD MS PLAN 50X/0.55 X-Y-Z STAGE, computers 7 video camera, Critical Dimension Measurement System. Computer controlled scanning photometric microscope instrument designed for measuring line widths, gaps and registration alignment. The effective measuring range is 0.5 to 125.0 microns. Stage X-Y movement: 4 in. x 4 in. Scan time of less than 5 secs. Mfg. 1999. 115V, 50/60 Hz | |
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| Nanometrics | CD-50-2 | Critical Dimension Measurement MEASUREMENT SYSTEM TO INCLUDE: 1 NANOMETRICS MICROSCOPE WITH TRINOCULAR HEAD, ISOLATION STAND, WHK 10X/20L EYEPIECES, OBJECTIVES: MS PLAN 5X/0.13, MS PLAN 20X/0.46, ULWD MS PLAN 50X/0.55 X-Y-Z STAGE, computers 7 video camera,Critical Dimension Measurement System. Computer controlled scanning photometric microscope instrument designed for measuring line widths, gaps and registration alignment. The effective measuring range is 0.5 to 125.0 microns. Stage X-Y movement: 4 in. x 4 in. Scan time of less than 5 secs. Mfg. 1999. 115V, 50/60 Hz | |
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Source Surplus, LLC • 5101 Deerchase Trail • Wake Forest, NC 27587
Email eric@dssurplus.com
• Phone: (919) 556-8930 • Fax: (919) 562-2165