All Items in Database


Process

Manufacturer Type Description  
Picture
Karl Suss MJB3 Karl Suss MJB3 mask aligner Top side only,505 power supply,Suss normal field microscope, UV300 exposure optics,Suss M400 normal field microscope, Leitz 10x eyepieces,Leitz 5x/10x/20X objectives,Suss 15W Illuminator,vacuum chuck,CCD camera, with monitor
Details
1731_E
Karl Suss MA6 Topside & IR mask aligner Capable of up to 8" wafers, Split field optics - torret type, UV 400 optics, 500 watt lamp mercury short-arc lamp, CIC 1000 power supply
Details
MA6_1
Karl Suss MA150CC Topside Mask Aligner Configured for up to 6” max. wafer Cassette to Cassette Proximity, Contact mask Aligner Top alignment system Split Field Optics Ringfield (Darkfield) Illumination 1000 Watt NUV Light Source HP model high precision alignment stage (accuracies to 0.1 micron) UV 400 (365/405 nm wave lengths) Resolution is 0.6-0.4 microns under optimum conditions CIC 1000 Watt Lamp power supply
Details
MA_150
Karl Suss MA56 Karl Suss MA56 topside mask aligner, Resolution: 3 µm (proximity) 0.8-1µm (vacuum contact),Capable of Hard Contact, Soft Contact, and Proximity Exposure Modes - Semi-Automatic operation (Auto Wafer Load/Unload) - 350W Lamphouse ,350 Watt CIC500 power supply- Splitfield Microscope
Details
Karlsussma56_374

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