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Metrology

Manufacturer Type Description  
Picture
KLA-Tencor 6420 Surfscan KLA 6420 Surfscan for Non-Patterned wafers, Capable of 3" -8" wafers, Low angle optics,Standard OEM puck,0.10 micron defect Sensitivity @ 95% capture on bare silicon, based on PSL standards,accuracy within 1% based on Tencor approved test specificaitons, 0.02 ppm Haze Sensitivity on Silicon, new Argon Laser,Win98 software,CD ROM writer, NIST Calibrated,new printer, network ready, upgraded electronics package, manuals,XY coordinates,GEM SECS: options available.
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KLAtencor6420
KLA-Tencor 4000 Model 4000 Surfscan
Details
KLA4000
KLA-Tencor 6100 Surfscan Capable of up to 200mm wafers Currently configured for 200mm wafers with PA-172 cassettes Red light laser for Non-Patterned Surface Inspection System 0.15 micron Defect Sensitivity @ 95% capture, based on PSL Standards 0.02 ppm Haze Sensitivity 0.002 ppm Haze Resolution Accuracy within 1% using approved VLSI Standard
Details
KLA6100_2
KLA-Tencor 6100 Surfscan Capable of up to 200mm wafers Currently configured for 200mm wafers with PA-172 cassettes Red light laser for Non-Patterned Surface Inspection System 0.15 micron Defect Sensitivity @ 95% capture, based on PSL Standards 0.02 ppm Haze Sensitivity 0.002 ppm Haze Resolution Accuracy within 1% using approved VLSI Standard
Details
KLA6100_1
KLA-Tencor 6100 Surfscan Capable of up to 200mm wafers Currently configured for 200mm wafers with PA-172 cassettes Red light laser for Non-Patterned Surface Inspection System 0.15 micron Defect Sensitivity @ 95% capture, based on PSL Standards 0.02 ppm Haze Sensitivity 0.002 ppm Haze Resolution Accuracy within 1% using approved VLSI Standard
Details
KLA6100_2
KLA-Tencor 6100 Surfscan Capable of up to 200mm wafers Currently configured for 200mm wafers with PA-172 cassettes Red light laser for Non-Patterned Surface Inspection System 0.15 micron Defect Sensitivity @ 95% capture, based on PSL Standards 0.02 ppm Haze Sensitivity 0.002 ppm Haze Resolution Accuracy within 1% using approved VLSI Standard
Details
KLA6100_1
KLA-Tencor Quantox KLA-Tencor Quantox 64100 Wafer capability of 4 - 12" (300mm), Options include: Quick Map, Lifetime, Bulk Recombination, Gate Film Oxide, Software Rev. # 3.2, SECS II/ GEM Communication Interface PC Anywhere Software Kelvin Probe Module 6061 Stainless Steel Chuck FEB Dissociation Light Assembly Pentium CPU with Windows NT Installed Chuck Electronics Module 2nd Cassette Option Cassette Ergo Loaders X/Y drive/controller chassis and motion controller card Wafer handling module Flat Panel Display
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Quantox
KLA-Tencor Swift Station Computer for 7700's
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None
KLA-Tencor 4500 Surface Contamination Analyser Model # 4500 Non-patterned wafer inspection capable of up to 6” wafers (150mm) Will Configure for 2” wafers capabilities, including 2” pan assembly, realignment, calibration, cassette elevator modification. Sensitivity 0.21um defect detection 0.4 ppm Haze Sensitivity Accuracy within 1% Throughput for 150 mm wafers – 60 wph Color Histograms/bit maps System will meet OEM specifications System will be NIST Calibrated (calibration standards are not included with system) Operators Manual included
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Tencor_4500
KLA-Tencor AIT1 High Throughput Scanning Patterned wafer Defect Inspection system for 100mm-200mm wafers, sensitivity 0.10um latex spheres on bare silicon and patterned process wafers,high speed air bearing stage, new 30mW Argon laser @488nm, Tencor 3.22 software rev., PRI robot and aligner,xy axis scan, simultaneous multi-channel collection for each channel and variable polarization, programmable spatial filter with variable angle programmable spatial filter.
Details
KLA_Tencor_AIT1

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Direct Source Surplus, LLC • 5101 Deerchase Trail • Wake Forest, NC 27587
Email eric@dssurplus.com • Phone: (919) 556-8930 • Fax: (919) 562-2165